Composition and method for polishing in metal CMP

ABSTRACT

A composition is provided in the present invention for polishing a composite semiconductor structure containing a metal layer (such as tungsten, aluminum, or copper), a barrier layer (such as tantalum, tantalum nitride, titanium, or titanium nitride), and an insulating layer (such as SiO 2 ). The composition comprises an aqueous medium, an oxidant, an organic polymer that attenuates removal of the oxide film. The composition may optionally comprise a complexing agent and/or a dispersant.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of application Ser. No. 09/329,225,filed Jun. 1, 1999, now abn, which claims the benefit of provisionalapplication Ser. No. 60/088,849 filed Jun. 10, 1998.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention described in this patent pertains to the polishing andplanarization of integrated circuit surfaces, particularly thosecomprising a metal, a barrier layer, and an insulating layer.

2. Discussion of Related Art

Chemical/Mechanical Planarization (or polishing), or CMP, is an enablingtechnology used in the semiconductor industry to remove/planarizevarious thin films from the surface of semiconductor substrates duringthe production of integrated circuits. While initial applications ofthis technology focused on the polishing of dielectric films (such asSiO₂), polishing of metal films used for circuit interconnects isundergoing rapid growth. Currently, tungsten and aluminum are the mostcommon metals used for interconnect structures. However, copperinterconnects, coupled with low-k dielectrics, have the potential (whencompared to Al/SiO₂) to increase chip speed, reduce the number of metallayers required, minimize power dissipation, and reduce manufacturingcosts.

However, the challenges associated with the successful integration ofcopper interconnects are not trivial. A typical copper interconnectstructure contains a trench formed in silicon dioxide (typically 10,000angstroms deep and 1-100 microns wide) formed above the siliconsubstrate. A barrier layer of material (used to improve adhesion of thecopper as well as inhibit the diffusion of copper into the dielectricstructure) is typically deposited after the trench is formed, and isusually composed of either tantalum, tantalum nitride, titanium, ortitanium nitride. This barrier material is also deposited on thehorizontal dielectric surface above the trench. The barrier layer istypically <1000 angstroms thick. Copper is then deposited by chemicalvapor deposition or electroplating on top of this structure in order tofill the trench structure. To insure complete filling of the trench, anoverlayer of copper of 10,000-15,000 angstroms is usually required. CMPis then used to remove the overburden of copper above the trench and thehorizontal barrier material above the trench. In order to do thissuccessfully and economically, the copper removal should be as fast aspossible, typically above 3000 angstroms/minute. Also, to avoid removalof the copper within the trench (typically referred to as “dishing”),removal of the barrier layer at rates comparable to that of the copperfilm are necessary. Additionally, to avoid degradation of the SiO₂ filmbeneath the barrier layer (typically referred to as “erosion”), and toimprove global planarization, the removal rate of the underlyingdielectric film should be as low as possible. In summary, theselectivity for the removal rate of the barrier film (tantalum, tantalumnitride, titanium, or titanium nitride) should be high with respect tothe copper film, while the selectivity for the removal rate of thedielectric film (SiO₂) should be low (preferably <100:1).

To accomplish these requirements, a two-step polishing process using twodifferent slurries has been proposed. In U.S. Pat. No. 5,676,587,Selective Polish Process for Titanium, Titanium Nitride, Tantalum, andTantalum Nitride, a two-step process using first (1) a slurry to removethe majority of the metal film (such as tungsten or copper) and second(2) a slurry to remove the barrier film is proposed.

To suppress the removal rate of silicon dioxide during CMP processes,various additives have been previously suggested that passivate thesilicon dioxide surface. In U.S. Pat. No. 5,614,444, Method of usingAdditives with Silica-Based slurries to Enhance Selectivity in MetalCMP, an additive comprising at least one polar component and one apolarcomponent is suggested to suppress oxide removal. This patent lists anumber of compounds containing both polar and non-polar groups, whichare either anionic (potassium butylsulphate), cationic (tetrabutylammonium hydroxide), or non-ionic (butanol). However, this patent claimsas a necessity both a polar and apolar component (group) to be present.

In U.S. Pat. No. 5,876,490 polyelectrolytes are used to coat theabrasive particles in a slurry. The polyelectrolytes impart normalstress effects to the slurries. In solution, the polyelectrolytesexhibit normal stress effects and their adsorption on the abrasiveparticles impart the same behavior to the particles.

According to U.S. Pat. No. 5,876,490, in order to achieve planarization,the quantity of polyelectrolyte in the abrasive suspension is such thata fraction of the particles will be coated with the polyelectrolyte,while another fraction of the abrasive particles will remain uncoated.In order to achieve this, the weight percent of the polyelectrolyteshould be about 5 to about 50 percent, preferably about 15 to about 30percent by, weight, and most preferably about 20 percent by weight ofthe abrasive particles in the slurry. These ratios depend somewhat onthe relative size of the abrasive particles and the polyelectrolyte.

The slurry compositions of U.S. Pat. No. 5,876,490 that contain thepolyelectrolyte are preferably prepared by adding the polyelectrolyte tothe slurry already containing the abrasive particles, thereby coating afraction of the abrasive particles “in situ.” In an alternativeprocedure, a fraction of the abrasive particles can be precoated andthen admixed with the slurry containing the remaining abrasive particleswhich will be uncoated. In addition, it may be desirable to pretreat aportion of the abrasive particles to render them more susceptible toadsorption of the polyelectrolyte from the slurry.

U.S. Pat. Nos. 5,391,258; 5,476,606; 5,738,800; 5,770,103 describecompounds which in CMP slurries provide attenuation of silicon dioxideremoval. These patents are hereby incorporated by reference and made apart of this specification.

SUMMARY OF THE INVENTION

The present invention is directed to one or more organic polymers whichhave surprisingly been found to attenuate the removal of the oxide filmduring metal CMP and offers an improvement over earlier slurries. Thisorganic polymer is a high molecular weight organic polymer containing acarbon backbone with functional moieties extending from the backbone.The functional moieties interact strongly with the silicon dioxidesurface so as to provide a protective layer that inhibits the removal ofthe silicon dioxide film at appreciable levels. The mechanism ofinteraction between the functional moieties and the hydroxyl surface is,though not limited to, that observed in the hydrogen bonding of polarspecies (such as the interaction of hydroxyl groups). The organicpolymer is further defined as a high molecular weight organic material,having a degree of polymerization of at least 3 (i.e., 3 monomeric unitspolymerized into a molecule), more preferably more than 10, and mostpreferably greater than 50. The organic polymer comprises a plurality ofmoieties having affinity to surface groups (i.e., silanol and siloxane)contained on silicon dioxide surfaces. These moieties are commonly polarmoieties, such as, but not limited to, hydroxy, carboxy, carbonyl,alkoxy, sulphonyl, and phosphonyl. Examples of this type of organicpolymer molecule includes polyvinyl alcohol, polyvinylpyrrolidone,polymethylmethacrylate, polyformaldehyde, polyethylene oxide,polyethylene glycol, and polymethacrylic acid.

Many of these same compounds are mentioned as being useful for coatingabrasive particles in U.S. Pat. No. 5,876,490 as discussed above. Theiruse as a silicon dioxide rate suppressant is not mentioned in '490.Moreover, the polyelectrolytes of the present invention have been foundto be effective as a silicon dioxide rate suppressant at concentrationsbelow about 5 percent by weight of the abrasive particles in a slurry.They have also been found to be effective when having a molecular weightof greater than about 10,000.

Another aspect of the present invention is a method of polishing asubstrate comprising a metal and an insulator wherein the substrate ispressed against a polishing pad, the substrate and the pad are movedrelative to each other, and a polishing composition is applied to saidpad during the polishing operation. The polishing compositions of thepresent invention are useful for such methods.

DESCRIPTION OF PREFERRED EMBODIMENTS

The slurries used in this invention were prepared with the followinggeneral protocol. In every case, the chemical additives are firstdissolved in deionized water. After all the chemical additives aredissolved in the deionized water, the pH is adjusted to the desiredlevel. In a separate vessel, the abrasive package which is comprised ofthe inorganic oxide abrasive particles in deionized water is mixed. ThepH of the abrasive package is also adjusted to the desired level. Thefinal step in the slurry formulation preparation is the combining of theaqueous chemical package with the aqueous abrasive package. Contrary toprior art, a polyelectrolyte additive can be added into this aqueoussolution without any special abrasive adsorption requirements.

Typically, the list of chemical additives includes an oxidizing agent,the organic polymer removal rate suppressant of this invention, andoptionally a complexing agent and/or a dispersant. The order of mixingof this chemical package need only be chosen such that there is completesolubilization of all the additives.

A complex as defined in “Advanced Inorganic Chemistry”, F. A. Cotton andG. Wilkinson, 3^(rd) ed., Wiley Interscience is: “The terms‘coordination compound’ and ‘complex’ may be broadly defined to embraceall species, charged or uncharged, in which a central atom is surroundedby a set of outer or ligand atoms, whereby the energy of the system islowered. (i.e. E>0 and/or G<0). An example of a neutral complex is SF₆,where the central S atom is surrounded by 6 F atoms in an octahedralarrangement. An example of a positive complex ion is [Cu(NH₃)₄]²⁺, wherethe central Cu atom is surrounded by 4 NH₃ molecules in a tetrahedralarrangement. An example of a negative complex ion is [Cu(Cl)₅]³⁻, wherethe central Cu atom is surrounded by 5 Cl atoms in a pentagonalbipyramid arrangement.” Examples of common ligands, which in theslurries of this invention are called complexing agents, are aceticacid, citric acid, ethyl acetoacetate, glycolic acid, glyoxylic acid,lactic acid, malic acid, oxalic acid, salicylic acid, sodiumdiethyldithiocarbamate, succinic acid, tartaric acid, thioglycolic acid,glycine, alanine, aspartic acid, ethylene diamine, trimethylene diamine,1,2 ethanedithiol, 1,4 dithiothreitol, bis(methylthio)methane,dimethyldithiocarbamate, 5-methyl 3,4 thiadiazole-2-thiol, malonic acid,gluteric acid, 3-hydroxybutyric acid, proprionic acid, pthallic acid,isopthallic acid, 3-hydroxy salicylic acid, 3,5-dihydroxy salicylicacid, and galic acid.

The slurries of this invention may optionally comprise a dispersant.Aqueous CMP slurries contain submicron abrasive particles. The size ofthese particles is important to the performance of the slurry as well asto the resultant surface quality. If the abrasive particles agglomerate,the polishing removal rates may change and the surface quality maydeteriorate. Dispersants can be included in the slurry formulation toprevent this agglomeration of abrasive particles. Dispersants can beanionic, cationic, or nonionic. The selection of the proper dispersantdepends on many factors including the surface characteristics of theabrasive particles and the ionic nature of the slurry formulation. Someexamples of ionic surfactants include sodium lauryl sulfate,cetyl-trimethyl ammonium bromide.

The oxidizing agent in the compositions of the present invention may becomprised of any of the common oxidizing agents such as nitrates,iodates, chlorates, perchlorates, chlorites, sulphates, persulphates,peroxides, ozonated water, and oxygenated water. Oxidizing agents can beused in slurries for CMP at concentrations of about 0.01% to about 7% byweight. Generally they are used at concentrations of about 1% to about7% by weight. An iodate is a preferred oxidizing agent. Most preferredis potassium iodate at about 2% to about 4% by weight.

In the examples presented below, silica and titania were predominantlyused as the abrasive component in the slurries tested. However, anymetal oxide or polishing abrasive (such as alumina, ceria, zirconia,barium carbonate, or diamond) could also be used.

EXAMPLES

Unless otherwise indicated, all percentages mentioned in the followingexamples are by weight in the slurries described.

Example 1

Table 1 shows the results of polishing copper, tantalum, and silicondioxide (formed from TEOS) wafers containing various amounts ofcomplexing agents and oxidants. These experiments were carried out on anIPEC/Westech 372U polisher using a Rodel IC1400 pad under the conditionsof 5 psi down pressure, 60 rpm carrier speed, 50 rpm platen speed, and aslurry flowrate of 110 ml/min. 6 inch sheet wafers were used. Allslurries in this example contain 10% colloidal silica abrasive (Klebosol1498), were at a pH of 10.5, and were adjusted to that pH with varyingamounts of potassium hydroxide.

TABLE 1 % Oxalic % Hydrogen Sample Acid Peroxide RR Cu RR Ta RR SiO₂ 1 00 202 340 1149 2 0 2 314 495 1261 3 3 0 214 416 1264 4 3 2 2038  1035 1202

These results show that in order to get high removal rates of bothcopper and the tantalum, it is necessary to have both a complexing agentthat increases the solubility of both metals in aqueous solution, aswell as contain a oxidant such as hydrogen peroxide. With thiscombination of components, it is possible to have satisfactory removalrates of copper while retaining a good selectivity (approximately 2:1)between the removal rates of copper and tantalum. It is also apparentfrom this example that additional components are needed to inhibit theremoval rate of silicon dioxide.

Example 2

Table 2 shows the results of polishing copper and silicon dioxide(formed from TEOS) wafers containing various amounts of agents that arethought to suppress oxide removal. These experiments were carried out onan IPEC/Westech 37213 polisher using a Rodel IC 1400 pad under theconditions of 5 psi down pressure, 3 psi back pressure, 60 rpm carrierspeed, 50 rpm platen speed, and a slurry flowrate of 110 ml/mm. 6 inchsheet wafers were used. All slurries in this example contain 10%colloidal silica abrasive (Klebosol 2498), 3% oxalic acid, 0.2% ammoniumhydroxide, 0.2% hydrogen peroxide, and were adjusted to the pH listedwith varying amounts of potassium hydroxide. The polyvinylpyrrolidone(PVP) used in the experiment below has a molecular weight between 10,000and 30,000 daltons (i.e. has a degree of polymerization between 90 and270). Sodium dodecyl sulfate (SDS), a traditional surfactant with apolar functional group and a long-chain hydrocarbon tail, is also testedfor comparison.

TABLE 2 Cu:SiO₂ Sample % PVP % SDS pH RR Cu RR SiO₂ Selectivity 1 0 0 68566 1070 8 2 0 0 8 8166 1066 7.7 3 1 0 6 6727  133 50 4 1 0 8 7207  12956 5 0 0.5 6 8591 1093 7.9 6 0 0.5 8 8187 1076 7.6

These results show that in order to get high removal rates of copper andlow removal rates of silicon dioxide (i.e., high selectivities), it isnecessary to have an additional component such as PVP to suppress thesilicon dioxide removal rate while not suppressing the copper removalrate. Also, traditional surfactants like SDS are observed not tosignificantly effect the removal rate of oxide or copper films.

Example 3

Table 3 shows the results of polishing copper and tantalum waferscontaining various amounts of complexing agents and oxidants. Theseexperiments were carried out on an IPEC/Westech 372U polisher using aRodel IC 1400 pad under the conditions of 5 psi down pressure, 3 psiback pressure, 60 rpm carrier speed, 50 rpm platen speed, and a slurryflowrate of 110 ml/min. 6 inch sheet wafers were used. All slurries inthis example contain 10% colloidal silica abrasive (Klebosol 1498),0.75% of PVP, and were adjusted to that pH with varying amounts ofnitric acid or potassium hydroxide.

TABLE 3 % Oxalic % Hydrogen RR Sample Acid Peroxide pH RR Cu Ta 1 0 02.5 206 920 2 0 0 6 226 132 3 0 2 2.5 866 372 4 0 2 6 256 312 5 2 0 2.5115 442 6 2 0 6  75 249 7 2 2 2.5 6237  430 8 2 2 6 1490  489

These results show that in order to get high removal rates of copperwhile retaining good tantalum removal rates, it is necessary to haveboth an oxidant and a complexing slurry.

Example 4

Table 4 shows the results of polishing copper, tantalum, tantalumnitride, and titanium wafers at two different pH levels. Theseexperiments were carried out on an IPEC/Westech 372U polisher using aRodel IC1400 pad under the conditions of 5 psi down pressure, 3 psi backpressure, 50 rpm carrier speed, 60 rpm platen speed, and a slurryflowrate of 120 ml/min. 6 inch sheet wafers were used. All slurries inthis example contain 7% titania abrasive (Degussa P-25), 0.7% of PVP, 4%oxalic acid, 1% hydrogen peroxide, and were adjusted to the specified pHby varying the amount of potassium hydroxide.

TABLE 4 RR Cu:Ta Cu: TaN Cu:Ti Cu:SiO₂ Sample pH Cu SelectivitySelectivity Selectivity Selectivity 1 5.0 2950 7 3 — >100 2 6.2 1600 3.91.3 2.6 >100

These results show that, by using an oxide suppressant, such as PVP,very high Cu:SiO₂ selectivities (above 100:1) can be achieved.

Example 5

Table 5 shows the results of polishing patterned wafers. Theseexperiments were carried out on an IPEC/Westech 372U polisher. ForSample 1, a Rodel IC1400/K-XY pad was used with the polishing conditionsof 3 psi down pressure, 2 psi back pressure, 40 rpm carrier speed, 65rpm platen speed, and a slurry flowrate of 150 ml/min. For sample 2, aRodel IC1000 pad under the conditions of 4 psi down pressure, 3 psi backpressure, 75 rpm carrier speed, 60 rpm platen speed, and a slurryflowrate of 150 ml/min. All slurries in this example contain 7% titaniaabrasive (Degussa P-25), 0.7% of PVP, 4% oxalic acid, 1% hydrogenperoxide, and were adjusted to the specified pH by varying the amount ofpotassium hydroxide.

TABLE 5 Oxide Erosion Dishing Dishing 50% pattern Sample pH 1 micronline 100 micron pad density 1 5.0 1836 1390  49 2 6.2 1120 — 560

These results show that the oxide erosion experienced with slurriescontaining compounds such as PVP is much lower than that typicallyobserved.

Example 6

The use of a polymeric additive has been shown to be effective at a widerange of dosing levels. In this example, PVP was added to a copperpolishing slurry at a level of about 4% based on the total abrasiveusing the slurry preparation method described above. Polishingperformance was measured using a Strasbaugh 6EC with a down force of 5psi and a platten speed of 80 rpm. Slurry flow rate was 150 ml/min.

In this example, the test slurry comprised KIO3 as an oxidant and lacticacid as a copper complexing agent, and 4% PVP based on the abrasivepresent. The polishing removal rate results are given in Table 6 below.

TABLE 6 Removal Rate Performance of a PVP containing Copper SlurryCopper RR (A.min) TaN RR (A/min) Oxide RR (A/min) 4465 137 165

Based on the data in Table 6, it is clear that PVP can be utilized atlow concentrations in a metal polishing slurry in order to achieve goodselectivity and low oxide removal rates.

Nothing in the foregoing Examples and discussion should in any way limitthe scope of the present invention which is given in the claims tofollow.

What is claimed is:
 1. A composition useful for chemical/mechanicalplanarization; of a semiconductor substrate having silicon dioxideunderlying a layer of metal, the metal to be removed by polishing thelayer of metal with the composition and a polishing pad, the compositioncomprising: an oxidant to oxidize the metal, a metal complexing agent,and an organic polymer dissolved in an aqueous solution for bonding withsilanol surface groups on the silicon dioxide to inhibits removal of thesilicon dioxide during removal of the layer of metal by the polishing.2. The composition according to claim 1 wherein the organic polymer hasa degree of polymerization of at least 3 and a molecular weight greaterthan 10,000.
 3. The composition according to claim 1 wherein the organicpolymer has a plurality of moieties selected from the group consistingof hydroxy, carboxy, carbonyl, alkoxy, sulphonyl and phosphonyl.
 4. Thecomposition according to claim 1 wherein the organic polymer is selectedfrom the group consisting of polyvinyl alcohol, polyvinylpyrrolidone,polymethylmethacrylate, polyformaldehyde, polyethylene oxide,polyethylene glycol and polymethacrylic acid.
 5. The compositionaccording to claim 1 wherein the organic polymer is polyvinyl alcohol.6. The composition according to claim 1 wherein the organic polymer ispolyvinylpyrrolidone.
 7. The composition according to claim 1 whereinthe organic polymer is polymethylmethacrylate.
 8. The compositionaccording to claim 1 wherein the organic polymer is polyformaldehyde. 9.The composition according to claim 1 wherein the organic polymer ispolyethylene oxide.
 10. The composition according to claim 1 wherein theorganic polymer is polyethylene glycol.
 11. The composition according toclaim 1 wherein the organic polymer is polymethacrylic acid.
 12. Acomposition useful for chemical/mechanical planarization of asemiconductor substrate having silicon dioxide underlying a layer ofmetal, the metal to be removed by polishing with the composition and apolishing pad, the composition comprising: an oxidant of the metal, acomplexing agent that increases solubility of ions of the metal, and anorganic polymer having a degree of polymerization of at least 3 and amolecular weight greater than 10,000, the organic polymer beingdissolved in an aqueous solution for bonding with silanol surface groupson the silicon dioxide, to inhibits removal of the silicon dioxideduring removal of the layer of metal by the polishing.
 13. Thecomposition according to claim 12 wherein the organic polymer has aplurality of moieties selected from the group consisting of hydroxy,carboxy, carbonyl, alkoxy, sulphonyl, and phosphonyl.
 14. Thecomposition according to claim 12 wherein the composition provides aselectivity between the metal and a dielectric layer in excess of 20:1.15. The composition according to claim 12 wherein the organic polymer isselected from the group consisting of polyvinyl alcohol,polyvinylpyrrolidone, polymethylmethacrylate alcohol, polyformaldehyde,polyethylene oxide, polyethylene glycol and polymethacrylic acid. 16.The composition according to claim 12 wherein the organic polymer ispolyvinyl alcohol.
 17. The composition according to claim 12 wherein theorganic polymer is polyvinylpyrrolidone.
 18. The composition accordingto claim 12 wherein the organic polymer is polymethylmethacrylate. 19.The composition according to claim 12 wherein the organic polymer ispolyformaldehyde.
 20. The composition according to claim 12 wherein theorganic polymer is polyethylene oxide.
 21. The composition according toclaim 12 wherein the organic polymer is polyethylene glycol.
 22. Thecomposition according to claim 12 wherein the organic polymer ispolymethacrylic acid.